PEM control provides real-time closed-loop control of reactive sputtering by monitoring plasma optical emission. In the TH Series in-line Low-E glass coating system, this function monitors emission intensity at a selected wavelength and automatically adjusts reactive gas flow to maintain the setpoint. It can be applied to a wide range of reactive sputtering processes within the detectable wavelength range.

• Broad Process Compatibility: Works with different reactive gases and coating materials, covering a wide range of process conditions within the measurable wavelength range.
• Precise Closed-Loop Control: Continuously monitors plasma conditions and automatically adjusts reactive gas flow to maintain the sputtering process at the target operating point.
• High Deposition Rate: Keeps the process at the desired work point, where a high deposition rate can be maintained. This can reduce energy consumption and the number of cathodes required for a given production capacity.
• Controlled Optical Properties: Allows control of the optical constants n and k and ensures that the deposited film has consistent optical performance.
• Fast Response: Rapid closed-loop response compensates for external process disturbances before they develop into larger variations in deposition conditions.